JPS6211022Y2 - - Google Patents
Info
- Publication number
- JPS6211022Y2 JPS6211022Y2 JP5093582U JP5093582U JPS6211022Y2 JP S6211022 Y2 JPS6211022 Y2 JP S6211022Y2 JP 5093582 U JP5093582 U JP 5093582U JP 5093582 U JP5093582 U JP 5093582U JP S6211022 Y2 JPS6211022 Y2 JP S6211022Y2
- Authority
- JP
- Japan
- Prior art keywords
- light
- amorphous semiconductor
- transmitting substrate
- patterned
- receiving region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 17
- 229910021417 amorphous silicon Inorganic materials 0.000 description 4
- 238000000059 patterning Methods 0.000 description 4
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 2
- -1 aluminum titanium silver Chemical compound 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5093582U JPS58153464U (ja) | 1982-04-07 | 1982-04-07 | 非晶質半導体受光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5093582U JPS58153464U (ja) | 1982-04-07 | 1982-04-07 | 非晶質半導体受光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58153464U JPS58153464U (ja) | 1983-10-14 |
| JPS6211022Y2 true JPS6211022Y2 (en]) | 1987-03-16 |
Family
ID=30061713
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5093582U Granted JPS58153464U (ja) | 1982-04-07 | 1982-04-07 | 非晶質半導体受光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58153464U (en]) |
-
1982
- 1982-04-07 JP JP5093582U patent/JPS58153464U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58153464U (ja) | 1983-10-14 |
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